Description
Histolab D-Panthenol Moisturizing Cream Mask
Histolab D-Panthenol Moisturizing Cream Mask is an intensively hydrating cream mask for dry, sensitive, and dehydrated skin. The formula, containing D-panthenol, ceramide NP, hydrolyzed hyaluronic acid, and hydrating lipids, helps replenish moisture, strengthen the skin's protective barrier, reduce dryness, and restore comfort, softness, and a healthy appearance.
Histolab D-Panthenol Moisturizing Cream Mask is designed to intensively restore skin experiencing moisture deficiency, discomfort, and increased sensitivity. This mask provides comprehensive care, combining deep hydration, nourishment, and support for the skin's natural protective barrier.
The formula helps reduce feelings of dryness and tightness, promoting skin recovery after exposure to adverse environmental factors, sun exposure, or cosmetic procedures. The creamy texture spreads easily over the skin, providing comfort during application, and leaves skin soft, smooth, and well-hydrated after rinsing.
The mask is suitable for regular home care and is especially recommended for dehydration, sensitivity, redness and decreased protective functions of the skin.
Benefits of D-Panthenol Moisturizing Cream Mask:
- Intensively moisturizes the skin.
- Helps restore the hydrolipidic barrier.
- Reduces the feeling of dryness and tightness.
- Softens and soothes sensitive skin.
- Supports skin restoration after cosmetic procedures.
- Improves skin comfort after exposure to the sun and adverse external factors.
- Makes skin smoother and more elastic.
- Suitable for regular care.
- Does not leave a feeling of heaviness.
- Suitable for all skin types, especially dry and sensitive.
Active ingredients:
- D-panthenol – intensively moisturizes the skin, helps restore the protective barrier, reduces the feeling of dryness and improves skin comfort.
- Ceramide NP – strengthens the skin’s lipid barrier, promotes moisture retention and protects the skin from dehydration.
- Hydrolyzed Hyaluronic Acid - Provides deep hydration, helps retain moisture and improves skin smoothness.
- Glycerin - attracts and retains moisture, maintaining optimal skin hydration levels.
- Hydrogenated lecithin – helps restore the skin’s protective barrier and improves its elasticity.
- Phytosteryl/Octyldodecyl Lauroyl Glutamate – helps strengthen the skin’s protective functions, softens and reduces moisture loss.
- Emollient complex (Cetearyl Olivate, Sorbitan Olivate) - nourishes the skin, improves its softness and helps maintain long-lasting hydration.
Directions for use:
After cleansing, apply the mask in a thick, even layer to your face, avoiding the eye area. Leave on for 10–15 minutes, then rinse thoroughly with warm water.
Recommended use 2-3 times a week or as needed. This mask is especially suitable for post-cosmetology care and for those experiencing severe dry skin.
Ingredients : Water, Glycerin, Cetearyl Alcohol, Zea Mays (Corn) Starch, Panthenol, 1,2-Hexanediol, Octyldodecanol, Glyceryl Stearate, Cetearyl Olivate, Dimethicone, Sorbitan Olivate, Titanium Dioxide, Hydroxyacetophenone, Carbomer, Fragrance, Polyglyceryl-10 Isostearate, Tromethamine, Butylene Glycol, Ethylhexylglycerin, Aluminum Hydroxide, Disodium EDTA, Hydrolyzed Hyaluronic Acid, Triethoxycaprylylsilane, Methyl Methacrylate Crosspolymer, Simethicone, Glyceryl Caprylate, Hydrogenated Lecithin, Ceramide NP, Phytosteryl/Octyldodecyl Lauroyl Glutamate, CI 42090
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